Hiden EQP是一臺結合質量和能量分析的儀器（Mass and Energy Analyser for Plasma Diagnostics），用于分析等離子過程中陰、陽離子、中性粒子以及自由基。
· 通過視口、接地電極和驅動電極進行分析
· 軟件控制的離子汲取系統(tǒng)，以使等離子體擾動最小· 所有能量范圍內，離子行程的最小擾動，及恒定離子傳輸
· 可調諧的離子源，用于電子附著選件的表觀電勢質譜分析
· Penning規(guī)和互鎖裝置可提供過壓保護
· 高靈敏度 / 穩(wěn)定的脈沖離子計數(shù)檢測器，有7個數(shù)量級的動態(tài)范圍
· 帶差式泵的三級過濾四極桿，質量數(shù)范圍至2500amu
· 45°靜電扇區(qū)分析器，掃描能量增量 0.05 eV / 0.25eV FWHM
· 1000eV 選配,，漂浮電壓可選至10keV；Faraday 檢測器用于高密度等離子體
· Mu-Metal，Radio-metal 屏蔽可選，高壓操作可選
· 信號選通分辨率0.1μs，用于研究脈沖等離子體或能量、質量分布隨時間的變化
· 通過RS232、RS485或Ethernet LAN，控制軟件MASsoft
EQP Mass and Energy Plasma Analyser (3.3 MB)
EQP Poster A3 size (254 KB)
EQP Poster A1 size (2.53 MB)
Mass Spectrometers for Thin Films, Plasma and Surface Engineering (1.1 MB)
AP0280 Advantages of HIPIMS of Silver for Improved E. coli Inactivation (248 KB)
AP0319 High power impulse magnetron sputtering (HIPIMS) and traditional pulsed sputtering (DCMSP) Ag-surfaces leading to E. coli inactivation (233KB)
AP0322 Composition and Species Evolution in a Laser-induced LuMnO3 Plasma (381 KB)
AP0371 In-situ Monitoring of the Growth of Silver Thin Film – the Influence of Sputtering Gas (283 KB)
AP-EQP-0001 - Negative-ion Surface Production in Hydrogen Plasmas (286 KB)
AP-EQP-0002 - Highly selective etching of SiO2 over Si3N4 and Si in capacitively coupled plasma employing C5HF7 gas (658 KB)
Mass and Energy Spectra of Plasmas 50 ns Time Resolved Measurements
Atmospheric Plasma Analysis by Molecular Beam MS (1.38 MB)
Atmospheric Pressure Plasma Analysis ICPIG (256 KB)
Effects of Pulsing on the P-CFUBMS of CrAIN Coatings (3.6 MB)
Ion Energy Distributions for a DC Plasma (144 KB)
Mass Spectroscopy of Metastable Atomic Species in Gas Analysis and Processing Plasmas at High Spectrometer Source Pressures - AVS 2011 (1.6 MB)
Surface Analysis by Plasma Assisted Desorption Ionisation Mass Spectrometry (PADI-MS) (195 KB)
Energy/Mass Spectrometer Analyser and Langmuir Probe Diagnostics for HIPIMS (1.88 MB)
Plasma Diagnostics in High Power Impulse Magnetron Sputtering Discharges - TIRI JSFS 2012 Tokyo YAG (3.52 MB)
AmesTechnology Capabilities and Facilities | Plasma Diagnostics
Research featuring data from the Hiden Analytical EQP Mass and Energy Analyser for Plasma Diagnostics
PSI – Paul Scherrer Institut | Plasma & Thin Film Analysis
Plasma and Thin Film Analysis
